A team of fusion researchers at TAE Technologies, Inc., in the U.S., working with colleagues from the University of ...

The Marvell Nanofabrication Laboratory at UC Berkeley recently received a donation of a multichamber semiconductor etching ...

President Donald Trump’s reciprocal tariffs have not spared even the high-flying chip industry, which powers various ...

has become a widely accepted method for the monitoring of plasma process. However, it is becoming less desirable due to the need for a higher hardmask selectivity in etch. Conventional OES analysis ...

creating plasma that emits EUV light. This process requires complex FPGA-based real-time control electronics to achieve precise timing and coordination. While it has proven to be highly effective ...

School of Chemical Engineering and Technology, Sun Yat-sen University, Guangzhou 510275, P. R. China ...