However, the process, known as reactive ion etching, isn't fully understood and could be improved. One recent development ...

Deposition of many important materials such as semi-conductors is performed using energetic jets under low pressure conditions. In addition, materials that have been deposited, such as silicon, are ...

Convenience and cost aside, there are a ton of valid reasons to spin up your own boards, ranging from not having to wait for shipping to just wanting to control the process yourself. Whichever ...

Both capacitively (RIE) and inductively (ICP) coupled plasma etcher with fluorine-based gases (CF4, CHF3, C4F8, SF6), BCl3, nitrogen, argon, and oxygen for anisotropic dry etching of Si-based ...

Similar to how a ship rusts when exposed to seawater, plasma used during the etching process continuously reacts with the internal components of the equipment, leading to corrosion and contamination.

What is Atomic Layer Etching? Atomic layer etching (ALE) is a highly controlled and selective etching technique that removes material layer by layer at the atomic scale. It is a cyclic process that ...

Several etch vendors are starting to ship next-generation selective etch tools, paving the way for new memory and logic devices. Applied Materials was the first vendor to ship a next-gen selective ...

This array of holes then acts as a mask for a standard plasma etching process that drills vertical nanocolumns in the insulator. Subsequent steps dissolve the partitions between the nanocolumns to ...

Reactive Ion Etch (RIE) is a physical etch process. A rich plasma has been made just above the wafer, and the ions are expedited toward the surface to generate a highly powerful anisotropic etch.

One of the main challenges is the control over the etching process, particularly in terms of the etch rate uniformity, surface roughness, and feature size variability. The development of advanced ...